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1 July 2005 Laser Flash Photolysis in a O3/Cl2 Mixture at 266 nm in a Very Low-Pressure Flow System
Jorge Codnia, Francisco Manzano, María Laura Azcárate
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Abstract

The laser flash photolysis in a very low-pressure flow system with mass spectrometry detection technique was developed for the study of oxidation reactions of chlorofluorocarbons. In this work, we have studied the UV photolysis of O3 in the presence of Cl2 at room temperature, which presents two catalytic cycles of O3 depletion with efficiencies dependent on the partial pressures in the photoreactor. The ozone dissociation was initiated with fourth harmonic pulses of a Nd:YAG laser. The detection of the reactants and the final and intermediate reaction products was performed with real-time mass spectrometry. The variations of the O3, Cl2 and ClO concentration were measured. The equations system associated to a proposed kinetic scheme was solved numerically and excellent agreement with the experimental results was obtained. The results from this work allowed the determination of the wall loss rates of the O(1D), Cl and ClO radicals.

Jorge Codnia, Francisco Manzano, and María Laura Azcárate "Laser Flash Photolysis in a O3/Cl2 Mixture at 266 nm in a Very Low-Pressure Flow System," Photochemistry and Photobiology 81(4), 802-806, (1 July 2005). https://doi.org/10.1562/2004-12-06-RA-395R.1
Received: 6 December 2004; Accepted: 1 February 2005; Published: 1 July 2005
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