Under a high-pressure mercury lamp (HPML) and using an exposure time of 4 h, the photoproduction of hydroxyl radicals (•OH) could be induced in an aqueous solution containing humic acid (HA). Hydroxyl radicals were determined by high-performance liquid chromatography using benzene as a probe. The results showed that •OH photoproduction increased from 1.80 to 2.74 μM by increasing the HA concentration from 10 to 40 mg L−1 at an exposure time of 4 h (pH 6.5). Hydroxyl radical photoproduction in aqueous solutions of HA containing algae was greater than that in the aqueous solutions of HA without algae. The photoproduction of •OH in the HA solution with Fe(III) was greater than that of the solution without Fe(III) at pH ranging from 4.0 to 8.0. The photoproduction of •OH in HA solution with algae with or without Fe(III) under a 250 W HPML was greater than that under a 125 W HPML. The photoproduction of •OH in irradiated samples was influenced by the pH. The results showed that HPML exposure for 4 h in the 4–8 pH range led to the highest •OH photoproduction at pH 4.0.
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Vol. 79 • No. 3