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1 April 2005 Yield of OH Radicals in Water under High-Density Energy Deposition by Heavy-Ion Irradiation
Mitsumasa Taguchi, Takuji Kojima
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Abstract

Taguchi, M. and Kojima, T. Yield of OH Radicals in Water under High-Density Energy Deposition by Heavy-Ion Irradiation. Radiat. Res. 163, 455–461 (2005).

The purpose of the present study was to evaluate the dependence of the OH radical yield on the atomic number and the energy of the heavy ions to understand chemical reactions of aqueous solutions. The total yields of oxidized products from phenol in water increased superlinearly as the incident energy increased from 5 MeV/nucleon to 18 MeV/nucleon for carbon and neon ions. The radiolytic yields of OH radicals produced by the ions were determined by analyzing the relationships of the oxidation yields of phenol to the incident energies up to 18 MeV/nucleon for ions in the range of LET from 110 eV/nm to 550 eV/nm and from 320 eV/nm to 1100 eV/nm for carbon and neon ions, respectively. The yields of the OH radicals increased with the specific energy for the same kind of ion and decreased with the atomic number for different ions used at the same specific energy.

Mitsumasa Taguchi and Takuji Kojima "Yield of OH Radicals in Water under High-Density Energy Deposition by Heavy-Ion Irradiation," Radiation Research 163(4), 455-461, (1 April 2005). https://doi.org/10.1667/RR3330
Received: 17 July 2004; Accepted: 1 September 2004; Published: 1 April 2005
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